2. Reverse Pulse & High-Frequency Pulse Plating
Conventional Direct Current (DC) electroplating often suffers from mass transport limitations, where metal ions near the cathode boundary layer become depleted, causing non-uniform crystal nucleation. Advanced procurement specifications now frequently mandate High-Speed Reverse Pulse Plating (PPR) capability.
By delivering high-amplitude microsecond forward pulses interleaved with short reverse etching pulses, pulse plating rectifiers reduce grain size, eliminate micro-cracking, decrease noble metal consumption (such as gold, platinum, and rhodium by up to 20%), and accelerate deposition speeds by over 30%.